新闻

COMPAC will be present at Design Shanghai 2019

COMPAC, will be one of the ten Spanish firms present at Design Shanghai 2019 (6-9 March). COMPAC will be unveiling its latest collections and the transgressive vision of design the brand applies to its materials.

Under the motto ‘The Surface Beyond’, COMPAC’s booth at Design Shanghai will star the centerpiece called Crater CC296, a sculpture conceived by the versatile artist Arik Levy, whose futuristic design evokes dialogue with spectators as a fundamental premise for interpreting a work of art.